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Conductive atomic force microscope (c-AFM) lithography can be utilized to create a wide range of LaAlO3/SrTiO3 (LAO/STO)-based nanoelectronic devices in a reconfigurable manner. Experiments were generally performed with intrinsically insulating LAO/STO heterostructures, with LAO thickness less than the critical value at which a polar catastrophe takes place [<4 unit cell (u.c.)]. Here, we use inductively coupled plasma reactive ion etching (ICPRIE) to fabricate c-AFM “canvases” on intrinsically conducting LAO/STO samples with ≥4 u.c. LAO. We observe that its interfacial two-dimensional electron gas (2DEG) can be pinched off and then switched back on by c-AFM lithography. Nanowires created with initially conductive LAO/STO interfaces have an order-of-magnitude longer lifetime in ambient conditions, when compared to an identically created 3.4 u.c. LAO/STO nanowire. We also demonstrate key nanoscale properties such as ballistic transport in a quasi-one-dimensional electron waveguide at a 5 u.c. LAO/STO interface. This approach frees c-AFM-written nanodevice designs from time constraints in air associated with <4 u.c. LAO/STO heterostructures. 

Abstract Charge ordering (CO), characterized by a periodic modulation of electron density and lattice distortion, has been a fundamental topic in condensed matter physics, serving as a potential platform for inducing novel functional properties. The charge-ordered phase is known to occur in a doped system with highd-electron occupancy, rather than low occupancy. Here, we report the realization of the charge-ordered phase in electron-doped (100) SrTiO₃epitaxial thin films that have the lowestd-electron occupancy i.e.,d¹-d⁰. Theoretical calculation predicts the presence of a metastable CO state in the bulk state of electron-doped SrTiO₃. Atomic scale analysis reveals that (100) surface distortion favors electron-lattice coupling for the charge-ordered state, and triggering the stabilization of the CO phase from a correlated metal state. This stabilization extends up to six unit cells from the top surface to the interior. Our approach offers an insight into the means of stabilizing a new phase of matter, extending CO phase to the lowest electron occupancy and encompassing a wide range of 3dtransition metal oxides. 

Abstract Interface engineering at complex oxide heterostructures enables a wide range of electronic functionalities critical for next‐generation devices. Here it is demonstrated that ultra‐low‐voltage electron beam lithography (ULV‐EBL) creates high‐quality mesoscale structures at LaAlO₃/SrTiO₃(LAO/STO) interfaces with greater efficiency than conventional methods. Nanowires, tunnel barriers, and electron waveguides are successfully patterned that exhibit distinctive transport characteristics including 1D superconductivity, nonlinear current–voltage behavior, and ballistic electron flow. While conductive atomic force microscopy (c‐AFM) previously enabled similar interface modifications, ULV‐EBL provides significantly faster patterning speeds (10 mm s⁻¹vs 1 µm s⁻¹), wafer‐scale capability (>(10 cm)²vs <(90 µm)²), and maintenance of pattern quality under vacuum conditions. Additionally, an efficient oxygen plasma treatment method is developed for pattern erasure and surface cleaning, which reveals novel surface reaction dynamics at oxide interfaces. These capabilities establish ULV‐EBL as a versatile approach for scalable interface engineering in complex oxide heterostructures, with potential applications in reconfigurable electronics, sensors, and oxide‐based devices.